ChEmpower Corp., a semiconductor materials company that develops polishing pads and chemical solutions, today announced Chakra, its first product designed to improve efficiency, reduce costs and ...

Taiwan - As the semiconductor industry continues to advance, the demand for precision processing becomes increasingly critical. Dr. Song, a global leader in the development of semiconductor process ...

The U.S. Chemical Mechanical Planarization market was valued at USD 1.79 billion in 2025 and is projected to reach USD 3.09 billion by 2035, growing at a CAGR of 5.63%. Growth is driven by rising ...

Today, ChEmpower, a leader in semiconductor process innovation, announced Chakra™, a family of functional polishing pads, beginning with the Copper Series, designed specifically for abrasive-free ...

Amidst the rapid advancement in AI chip development, emerging technologies like chiplets are making semiconductor backend processes more intricate. As a result, the prices and profit potentials of ...

Carbon nanotube sandpaper polishes semiconductor surfaces down to a few atoms, reducing defects by 67% and eliminating chemical slurry waste.

The performance and stability of smartphones and artificial intelligence (AI) services depend on how uniformly and precisely ...

Chemical mechanical polishing (CMP) is a process of global planarization that leverages the synergetic effect of chemical reactions and mechanical abrasion to facilitate wafer polishing. CMP has ...

This higher density of circuitry on a wafer requires greater accuracy and a highly fragile and advanced fabrication process. Several newer and highly complex ICs today are made of a dozen or more ...